A physically grounded damped dispersion model with particle mesh Ewald summation


Journal article


Joshua A Rackers, Chengwen Liu, Pengyu Ren, Jay W Ponder
The Journal of chemical physics, vol. 149, AIP Publishing, 2018, p. 084115

Cite

Cite

APA   Click to copy
Rackers, J. A., Liu, C., Ren, P., & Ponder, J. W. (2018). A physically grounded damped dispersion model with particle mesh Ewald summation. The Journal of Chemical Physics, 149, 084115.


Chicago/Turabian   Click to copy
Rackers, Joshua A, Chengwen Liu, Pengyu Ren, and Jay W Ponder. “A Physically Grounded Damped Dispersion Model with Particle Mesh Ewald Summation.” The Journal of chemical physics 149 (2018): 084115.


MLA   Click to copy
Rackers, Joshua A., et al. “A Physically Grounded Damped Dispersion Model with Particle Mesh Ewald Summation.” The Journal of Chemical Physics, vol. 149, AIP Publishing, 2018, p. 084115.


BibTeX   Click to copy

@article{rackers2018a,
  title = {A physically grounded damped dispersion model with particle mesh Ewald summation},
  year = {2018},
  journal = {The Journal of chemical physics},
  pages = {084115},
  publisher = {AIP Publishing},
  volume = {149},
  author = {Rackers, Joshua A and Liu, Chengwen and Ren, Pengyu and Ponder, Jay W}
}


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